Challenges in suspending CVD graphene: More than capillary effects

Author

Aydin, O.I. ; Hallam, Toby ; Thomassin, J.L. ; Mouis, M. ; Duesberg, G.

Author_Institution

Grenoble INP, Minatec, Grenoble, France

fYear

2014

fDate

7-9 April 2014

Firstpage

33

Lastpage

36

Abstract

It is known that the fabrication of graphene NEMS raises several technological issues. Beyond capillarity effects, the quality of the interface between graphene and resist is the most critical challenge. In this paper we propose a high yield route for the fabrication of suspended graphene structures, using technological steps compatible with large-scale fabrication. AFM and Raman characterization results are used to probe suspension, added defects and strain evolution during the process.

Keywords

chemical vapour deposition; graphene; nanoelectromechanical devices; nanofabrication; AFM; CVD graphene; Raman characterization; capillary effects; graphene NEMS fabrication; high yield route; large-scale fabrication; probe suspension; resist; strain evolution; suspended graphene structures; Etching; Fabrication; Graphene; Hafnium; Resists; Strain; AFM; CVD Graphene; Raman spectroscopy; mechanical strain; processing technology; suspended beams;

fLanguage

English

Publisher

ieee

Conference_Titel

Ultimate Integration on Silicon (ULIS), 2014 15th International Conference on

Conference_Location

Stockholm

Type

conf

DOI

10.1109/ULIS.2014.6813899

Filename

6813899