• DocumentCode
    1395337
  • Title

    Voltage of the vacuum arc with a ring anode in an axial magnetic field

  • Author

    Keidar, Michael ; Beilis, Isak I. ; Boxman, Raymond L. ; Goldsmith, Samuel

  • Author_Institution
    Dept. of Interdisciplinary Studies, Tel Aviv Univ., Israel
  • Volume
    25
  • Issue
    4
  • fYear
    1997
  • fDate
    8/1/1997 12:00:00 AM
  • Firstpage
    580
  • Lastpage
    585
  • Abstract
    The plasma jet focusing and voltage distribution in the interelectrode gap of a vacuum arc with a ring anode and subjected to an axial magnetic field were studied theoretically. A two-dimensional model was developed based on the free plasma jet expansion into vacuum, and the steady-state solution of the fully ionized plasma in the hydrodynamic approximation was analyzed. It was found that the imposition of an axial magnetic field reduces the radial expansion of the plasma jet. The characteristic jet angle decreases from about 40° in the zero magnetic field case and approaches a value of about 20° with a 0.02 T magnetic field. The arc voltage consisting of the cathode drop, the plasma voltage drop, and anode sheath drop increased, with the imposition of a magnetic field, and decreased with the anode length. The model was compared to experimental measurements of the vacuum arc voltage behavior in an axial magnetic field, and good agreement was found
  • Keywords
    anodes; electric potential; plasma jets; plasma sheaths; vacuum arcs; voltage distribution; 0.02 T; anode sheath drop; axial magnetic field; cathode drop; characteristic jet angle; free plasma jet expansion; fully ionized plasma; hydrodynamic approximation; interelectrode gap; magnetic field; plasma jet focusing; plasma voltage drop; ring anode; steady-state solution; two-dimensional model; vacuum arc; voltage; voltage distribution; Anodes; Hydrodynamics; Magnetic field measurement; Magnetic fields; Plasma measurements; Plasma properties; Plasma sheaths; Steady-state; Vacuum arcs; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.640668
  • Filename
    640668