• DocumentCode
    1395463
  • Title

    Optical emission spectroscopy in cathodic arc deposition

  • Author

    Kühn, Michael ; Pintaske, Rainer ; Richter, Frank

  • Author_Institution
    Inst. of Phys., Tech. Univ. Chemnitz, Germany
  • Volume
    25
  • Issue
    4
  • fYear
    1997
  • fDate
    8/1/1997 12:00:00 AM
  • Firstpage
    694
  • Lastpage
    699
  • Abstract
    Titanium and chromium arc discharges in nitrogen and argon in the pressure range between 10-3 and 1 Pa have been studied using optical emission spectroscopy and electric probes. The pressure dependence of normalized line intensities could be explained in terms of the metal vapor generation at the cathode as well as ion-molecule collisions in the arc plasma far from the cathode. Obviously, inelastic electron collisions do not play a decisive role. The excited levels of metal species were found to be populated according to a Boltzmann distribution. An excitation temperature of about 0.3 eV was calculated for the neutrals, whereas the excitation temperature of ions was somewhat higher. The degree of vibrational excitation of various electronic states of the N2 molecule was found to be nearly the same in Cr and Ti are discharges, respectively. The main result of the present study was that the excitation degree of chromium and titanium are discharges in argon and nitrogen, respectively, is similar
  • Keywords
    plasma collision processes; plasma deposition; plasma diagnostics; plasma probes; plasma temperature; vacuum arcs; vacuum deposition; 0.001 to 1 Pa; 0.3 eV; Ar; Boltzmann distribution; Cr; Cr arc discharges; N2; Ti; Ti arc discharges; arc plasma; cathodic arc deposition; electric probes; electronic states; excitation temperature; excited levels; inelastic electron collisions; ion-molecule collisions; metal vapor generation; normalized line intensities; optical emission spectroscopy; pressure dependence; vibrational excitation; Arc discharges; Argon; Cathodes; Chromium; Electron optics; Nitrogen; Plasma temperature; Spectroscopy; Stimulated emission; Titanium;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.640688
  • Filename
    640688