• DocumentCode
    1397014
  • Title

    Step out of the light [Electronics lithography]

  • Author

    Edwards, Chris ; Sawicki, J.

  • Volume
    5
  • Issue
    17
  • fYear
    2010
  • Firstpage
    34
  • Lastpage
    35
  • Abstract
    The paper presents the different techniques in fabricating wafer process and the used of EUV lithography and it would still do a side bet on optical lithography. And to maximise the use of grating-like feature, chipmakers such as Intel and Samsung are using a technique called double patterning. Here. the exposure is performed in two stages using two different masks.
  • Keywords
    ultraviolet lithography; EUV lithography; double patterning; grating-like feature; optical lithography; wafer process fabrication;
  • fLanguage
    English
  • Journal_Title
    Engineering & Technology
  • Publisher
    iet
  • ISSN
    1750-9637
  • Type

    jour

  • Filename
    5659712
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1397014