Title :
A Highly Scalable Interface Fuse for Advanced CMOS Logic Technologies
Author :
Yang, Li-Yu ; Hsieh, Min-Che ; Liu, Jheng-Sin ; Chin, Yung-Wen ; Lin, Chrong Jung
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing-Hua Univ., Hsinchu, Taiwan
Abstract :
In this letter, we propose a novel interface fuse (iFuse) for low-power electrically programmable fuses in advanced CMOS applications. With an offset-landed metal-to-contact or contact-to-polysilicon structure, the iFuse can be programmed by substantially reduced current as compared to conventional fuses. A diagonal contact layout and the optical pattern correction scheme can further improve the cell stability as well as its programming characteristics.
Keywords :
CMOS logic circuits; programmable logic arrays; CMOS logic technology; contact-to-polysilicon structure; diagonal contact layout; highly scalable interface fuse; iFuse; low power electrically programmable fuse; offset landed metal-to-contact; optical pattern correction; CMOS integrated circuits; CMOS technology; Fuses; Layout; Metals; Programming; Resistance; Electrically programmable; fuse; metal–contact interface;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2175696
