Title :
Optimal current for minimum thermal noise operation of submicrometer MOS transistors
Author :
Triantis, Dimitris P. ; Birbas, Alexios N.
Author_Institution :
Dept. of Electr. Eng., Patras Univ., Greece
fDate :
11/1/1997 12:00:00 AM
Abstract :
The wide band noise voltage (equivalent thermal noise voltage at the gate) of a submicron MOSFET, working in saturation, exhibits a minimum value at a certain drain current. This is supported by measurements and theoretical analysis based on a suitable thermal noise model. This macroscopic noise model attributes the thermal noise of the drain current to the superposition of two noise sources originating from two separate regions of the transistor´s channel (a gradual channel approximation region and a saturation region). The existence of a minimum of the noise spectral density at an optimum drain current (Iopt), is well proved by measurements and is contradictory to the predictions of the current simulation program with integrated circuit emphasis (SPICE) models. An empirical way for evaluating analytically Iopt is given. The fact of the existence of a noise minimum for a submicron MOSFET, brings a phenomenological equivalence to the bipolar transistor and GaAs MESFET when they are employed at the first stage of an amplifier
Keywords :
MOSFET; semiconductor device models; semiconductor device noise; thermal noise; drain current; gradual channel approximation region; macroscopic noise model; minimum thermal noise operation; noise spectral density; optimal current; phenomenological equivalence; saturation region; submicrometer MOS transistors; wide band noise voltage; Current measurement; Density measurement; Integrated circuit measurements; Integrated circuit noise; MOSFET circuits; Noise measurement; Optimized production technology; SPICE; Voltage; Wideband;
Journal_Title :
Electron Devices, IEEE Transactions on