DocumentCode
1402209
Title
Stress-induced effects by the anodic oxide in ridge waveguide laser diodes
Author
Buda, M. ; Iordache, G. ; Acket, G.A. ; van der Roer, T.G. ; Kaufmann, L.M.F. ; van Roy, B.H. ; Smallbrugge, E. ; Moerman, I. ; Sys, C.
Author_Institution
COBRA Interuniv. Res. Inst. on Commun. Technol., Eindhoven Univ. of Technol., Netherlands
Volume
36
Issue
10
fYear
2000
Firstpage
1174
Lastpage
1183
Abstract
This paper studies, both theoretically and experimentally, stress-induced effects on the lateral far-field behavior for ridge-type semiconductor laser diodes where anodic oxide is used for the definition of the stripe width. These effects consist of antiguiding under the stripe region, and of two positive waveguiding features near the stripe edges. For low-threshold devices, these effects may be more important than thermal effects, depending on the stress in the oxide. They put a lower limit on the built-in index guiding to be introduced by lateral etch outside the ridge region in order to maintain fundamental mode operation for wider stripes. The magnitude of these effects may be as large as /spl Delta/n/sub ef/=1/spl times/10/sup -3/. An analytical mathematical model is deduced for computing stresses and strains for a certain ridge-shaped interface which bounds the elastic medium.
Keywords
elasticity; etching; laser theory; oxidation; ridge waveguides; semiconductor device models; semiconductor lasers; waveguide lasers; yield stress; anodic oxide; antiguiding; computing stresses; elastic medium; fundamental mode operation; lateral etch; lateral far-field behavior; positive waveguiding features; ridge waveguide laser diodes; ridge-shaped interface; ridge-type semiconductor laser; stress-induced effects; stripe region; stripe width; thermal effects; Capacitive sensors; Computer interfaces; Diode lasers; Etching; Laser theory; Mathematical model; Semiconductor lasers; Semiconductor waveguides; Thermal stresses; Waveguide lasers;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.880658
Filename
880658
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