DocumentCode :
1405707
Title :
Effect of polysilicon depletion effect on series resistance and transconductance of MOS transistors at 4.2 K
Author :
Gutierrez, D.
Author_Institution :
INAOE, Puebla
Volume :
34
Issue :
12
fYear :
1998
fDate :
6/11/1998 12:00:00 AM
Firstpage :
1264
Lastpage :
1265
Abstract :
Experimental results of the effect of the polysilicon depletion effect on 0.5 μm MOS transistors, operated at 4.2 K, are shown here. These results serve to shed light on the interplay of series resistance, freeze-out, and field-induced charge ionisation effects on the characterisation and modelling of sub-micrometre MOSFETs operated at 4.2 K
Keywords :
MOS capacitors; MOSFET; elemental semiconductors; semiconductor device models; silicon; 0.5 micron; 4.2 K; MOS transistors; Si; field-induced charge ionisation effects; freeze-out; modelling; polysilicon depletion effect; series resistance; sub-micrometre MOSFETs; transconductance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19980890
Filename :
702415
Link To Document :
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