Wurtzite GaN-based heterostructures by molecular beam epitaxy

Progress in plasma and reactive molecular beam epitaxy (PMBE and RMBE) grown n- and p-type GaN and GaN-AlGaN-based epitaxial films and optoelectronic devices is reviewed. The growth of GaN by RMBE (PMBE) is achieved by employing ammonia gas (plasma activated nitrogen) as the nitrogen source with resultant growth rates of about 2 μm/h (⩾1 μm/h). The structural, electrical, and optical properties of binary and ternary (Al,Ga)N and (In,Ga)N layers point to high quality. The GaN layers with Mg as the dopant atoms are p-type without any postgrowth treatment, but the hole concentrations are limited to mid 10¹⁷ cm^-3 although reports in the low 10¹⁸ cm^-3 dot the literature. The background carrier concentration, mobility, optical characteristics and ability to dope p-type depend significantly on the substrate temperature and V-III ratio employed, AlGaN-GaN, and GaN-InGaN electroluminescent devices have been realized but lack commercial quality. The AlGaN-GaN photodiodes by RMBE exhibited a maximum zero-bias responsivity of 0.12 A/W at 364 nm, which decreased by more than three orders of magnitude for wavelengths longer than 390 nm. A reverse bias of -10 V raised the responsivity to 0.15 A/W without any significant increase in noise. The noise equivalent noise power near zero bias is below the detection limit of the measurement setup. At a reverse bias of 28 V, the total noise equivalent power is 2.06×10^-11 W