DocumentCode
1407657
Title
Collector-base junction avalanche multiplication effects in advanced UHV/CVD SiGe HBTs
Author
Niu, Guofu ; Cressler, John D. ; Gogineni, Usha ; Harame, David L.
Author_Institution
Dept. of Electr. Eng., Auburn Univ., AL, USA
Volume
19
Issue
8
fYear
1998
Firstpage
288
Lastpage
290
Abstract
The collector-base junction avalanche multiplication factor (M-1) in SiGe HBTs is investigated using a new technique better tolerant to self-heating and collector-base leakage. The new technique provides higher accuracy at low current densities and enables M-1 to be measured at high current densities typically used in circuits. Comparisons with identically processed silicon control devices show that M-1 is not inadvertently increased by the incorporation of SiGe, despite its smaller bandgap. With cooling, M-1 first increases, and then saturates when T<117 K. A 2.3 V critical reverse CB voltage at which base current reversal occurs is observed down to 83 K, which is sufficiently high for today´s bipolar and BiCMOS logic applications.
Keywords
CVD coatings; Ge-Si alloys; avalanche breakdown; energy gap; heterojunction bipolar transistors; semiconductor materials; M-1; SiGe; UHV/CVD SiGe HBT; bandgap engineering; collector-base junction avalanche multiplication factor; collector-base leakage; current density; self-heating; Circuits; Cooling; Current density; Current measurement; Density measurement; Germanium silicon alloys; Photonic band gap; Process control; Silicon germanium; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/55.704402
Filename
704402
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