• DocumentCode
    1407657
  • Title

    Collector-base junction avalanche multiplication effects in advanced UHV/CVD SiGe HBTs

  • Author

    Niu, Guofu ; Cressler, John D. ; Gogineni, Usha ; Harame, David L.

  • Author_Institution
    Dept. of Electr. Eng., Auburn Univ., AL, USA
  • Volume
    19
  • Issue
    8
  • fYear
    1998
  • Firstpage
    288
  • Lastpage
    290
  • Abstract
    The collector-base junction avalanche multiplication factor (M-1) in SiGe HBTs is investigated using a new technique better tolerant to self-heating and collector-base leakage. The new technique provides higher accuracy at low current densities and enables M-1 to be measured at high current densities typically used in circuits. Comparisons with identically processed silicon control devices show that M-1 is not inadvertently increased by the incorporation of SiGe, despite its smaller bandgap. With cooling, M-1 first increases, and then saturates when T<117 K. A 2.3 V critical reverse CB voltage at which base current reversal occurs is observed down to 83 K, which is sufficiently high for today´s bipolar and BiCMOS logic applications.
  • Keywords
    CVD coatings; Ge-Si alloys; avalanche breakdown; energy gap; heterojunction bipolar transistors; semiconductor materials; M-1; SiGe; UHV/CVD SiGe HBT; bandgap engineering; collector-base junction avalanche multiplication factor; collector-base leakage; current density; self-heating; Circuits; Cooling; Current density; Current measurement; Density measurement; Germanium silicon alloys; Photonic band gap; Process control; Silicon germanium; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.704402
  • Filename
    704402