• DocumentCode
    1407682
  • Title

    InAlAs/InGaAs channel composition modulated transistors with InAs channel and AlAs/InAs superlattice barrier layer

  • Author

    Onda, K. ; Fujihara, A. ; Wakejima, A. ; Mizuki, E. ; Nakayama, T. ; Miyamoto, H. ; Ando, Y. ; Kanamori, M.

  • Author_Institution
    Kansai Electron. Res. Labs., NEC Corp., Shiga, Japan
  • Volume
    19
  • Issue
    8
  • fYear
    1998
  • Firstpage
    300
  • Lastpage
    302
  • Abstract
    We have successfully fabricated a new type of InAlAs/InGaAs heterojunction FET (HJFET) with modulated indium composition channels, called channel composition modulated transistors (CCMTs) in which an InAs channel is sandwiched by In/sub 0.53/Ga/sub 0.47/As/In/sub 0.8/Ga/sub 0.2/As sub-channels. The fabricated devices also employ an AlAs/InAs superlattice as a barrier layer against impurity contamination to provide high thermal stability. A 0.2-μm T-shaped gate device exhibits a g/sub m/ of 1370 mS/mm, FT of 180 GHz and Fmax of 210 GHz at a low drain bias of 1.0 V. In high-temperature DC life tests conducted at more than 230/spl deg/C, the devices exhibited less than a 3% degradation in I/sub dss/ and g/sub m/ after 1000 h. This demonstrates that these newly-developed CCMTs incorporating AlAs/InAs superlattice insertion technology can offer high-performance and highly-reliable InP-based HJFET´s for various microwave and millimeter-wave applications.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; junction gate field effect transistors; semiconductor superlattices; 0.2 micron; 1.0 V; 180 to 210 GHz; 230 C; AlAs-InAs; AlAs/InAs superlattice barrier; InAlAs-InGaAs; InAlAs/InGaAs channel composition modulated transistor; InAs channel; T-shaped gate device; heterojunction FET; high-temperature DC life test; impurity contamination; insertion technology; thermal stability; Contamination; Degradation; FETs; Heterojunctions; Impurities; Indium compounds; Indium gallium arsenide; Life testing; Superlattices; Thermal stability;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.704406
  • Filename
    704406