Title :
High wear durability of ECR-sputtered carbon films
Author :
Hirono, S. ; Umemura, S. ; Andoh, Y. ; Hayashi, T. ; Kaneko, R.
Author_Institution :
NTT Integrated Inf. & Energy Syst. Labs., Tokyo, Japan
fDate :
7/1/1998 12:00:00 AM
Abstract :
We investigated the effect of ion irradiation on the wear of carbon films prepared by electron-cyclotron-resonance plasma (ECR) sputtering. The wear durability of the ECR-sputtered films was far superior to that of the RF-sputtered films. ECR-sputtered films made with a high energy ion irradiation showed the highest irradiation wear resistance, nearly equal to that of bulk diamond. We attribute this high durability to selective etching of the weakly bonded carbon atoms by the high-energy ion irradiation
Keywords :
carbon; magnetic recording; sputter deposition; sputter etching; wear resistant coatings; C; ECR-sputtered carbon films; electron-cyclotron-resonance plasma sputtering; high energy ion irradiation; high wear durability; high-energy ion irradiation; ion irradiation; irradiation wear resistance; magnetic recording; selective etching; weakly bonded carbon atoms; wear; Acceleration; Atomic layer deposition; Current density; Magnetic films; Optical films; Plasma applications; Radio frequency; Sputtering; Substrates; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
