Title :
Material and tribological properties of a-C:H film by plasma CVD for a disk overcoat
Author :
Toyaguchi, T. ; Yamamoto, Takayuki
Author_Institution :
File Memory Lab., Fujitsu Labs. Ltd., Atsugi, Japan
fDate :
7/1/1998 12:00:00 AM
Abstract :
Amorphous hydrogenated carbon (a-C:H) film deposited by plasma chemical vapor deposition (PCVD) using toluene as a monomer is durable enough for a very thin magnetic disk overcoat. In this paper, we discuss the effect of deposition conditions on material and mechanical properties of this film. Lowering deposition gas pressure increases the amount of sp3 bonded carbon and the hardness, and decreases the hydrogen content of the film. Increasing bias voltage leads to the same effects. Properties of a PCVD film could be well controlled by the hydrogen content besides the amount of sp3 bonded carbon. PCVD films were more durable than sputtered a-C:H films of less than 10 nm thickness. A PCVD film enables us to reduce disk overcoat thickness
Keywords :
amorphous state; carbon; hardness; hydrogen; magnetic disc storage; noncrystalline structure; plasma CVD; wear resistant coatings; 10 nm; C:H; a-C:H film; amorphous hydrogenated carbon; bias voltage; deposition conditions; deposition gas pressure; disk overcoat; disk overcoat thickness; hardness; hydrogen content; plasma CVD; plasma chemical vapor deposition; sp3 bonded carbon; thin magnetic disk overcoat; toluene; tribological properties; Amorphous magnetic materials; Amorphous materials; Bonding; Chemical vapor deposition; Hydrogen; Magnetic films; Magnetic materials; Plasma chemistry; Plasma materials processing; Plasma properties;
Journal_Title :
Magnetics, IEEE Transactions on
