Title :
Magnetization, magnetostriction and film stress of Fe monolayers on W(100)
Author :
Sander, D. ; Enders, A. ; Kirschner, J.
Author_Institution :
Max-Planck-Inst. fur Mikrostrukturphys., Halle, Germany
fDate :
7/1/1998 12:00:00 AM
Abstract :
Film stress, magnetization and magnetoelastic coupling are measured in situ by a simple optical deflection technique. This technique reveals that 2 nm thin Fe films grown on W(100) show magnetoelastic coupling that differs in both magnitude and sign from Fe bulk data. Stress contributions to the magnetoelastic coupling are discussed to describe this peculiar magnetoelastic behavior that is observed for Fe films thinner than 20 nm
Keywords :
bending; ferromagnetic materials; internal stresses; iron; magnetic epitaxial layers; magnetisation; magnetoelastic effects; magnetostriction; monolayers; 2 nm; Fe; Poisson ratio; W; W(100) substrate; Young´s modulus; cantilever bending; epitaxial misfit; film stress; in situ measurement; magnetization; magnetoelastic coupling; magnetostriction; optical deflection technique; thin Fe monolayers; ultrathin films; Couplings; Iron; Magnetic field induced strain; Magnetic films; Magnetization; Magnetostriction; Optical films; Strain measurement; Stress measurement; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
