Title :
Multibit Operation of Nanoelectromechanical Memory Cells
Author :
Lee, Kwangseok ; Choi, Woo Young
Author_Institution :
Dept. of Electron. Eng., Sogang Univ., Seoul, South Korea
fDate :
3/1/2012 12:00:00 AM
Abstract :
The multibit operation of nanoelectromechanical memory cells has been modeled analytically. Based on the modeling results, the design guideline for stable multibit operation has been presented. Large release voltage shift can be obtained by decreasing the initial gap between the charge-trapped layer and beam , the initial gap between the assistant word line and beam , beam thickness , and Young´s modulus or by increasing the effective oxide thickness and beam length .
Keywords :
Young´s modulus; integrated memory circuits; nanoelectromechanical devices; Young modulus; assistant word line; beam length; beam thickness; charge-trapped layer; design guideline; multibit operation; nanoelectromechanical memory cells; oxide thickness; voltage shift; Analytical models; Approximation methods; Educational institutions; Force; Hysteresis; Nonvolatile memory; Structural beams; Analytical modeling; H cell; T cell; multibit operation; nanoelectromechanical (NEM) memory;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2011.2178390