Title :
In the flow with MEMS
Author :
Rasmussen, Angela ; Zaghloul, Mona E.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., George Washington Univ., Washington, DC, USA
fDate :
7/1/1998 12:00:00 AM
Abstract :
Presents an overview of MEMS technology where we look at the different micromachining techniques and the CMOS fabrication process. Next we provide general information about flow sensors, including common applications. We will then analyze the structures used for MEMS flow sensors along with their associated CMOS circuits which can integrate the flow sensor into a smart flow-sensor system
Keywords :
CMOS analogue integrated circuits; flow measurement; intelligent sensors; micromachining; microsensors; CMOS fabrication process; MEMS technology; flow sensors; micromachining techniques; smart sensor system; Anisotropic magnetoresistance; Circuits; Dry etching; Micromachining; Micromechanical devices; Silicon; Substrates; Thin film sensors; Transistors; Wet etching;
Journal_Title :
Circuits and Devices Magazine, IEEE
