Title :
Characterization of Encapsulated Micromechanical Resonators Sealed and Coated With Polycrystalline SiC
Author :
Yoneoka, Shingo ; Roper, Christopher S. ; Candler, Robert N. ; Chandorkar, Saurabh A. ; Graham, Andrew B. ; Provine, J. ; Maboudian, Roya ; Howe, Roger T. ; Kenny, Thomas W.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., Stanford, CA, USA
fDate :
4/1/2010 12:00:00 AM
Abstract :
This paper presents the characterization of sealed microelectromechanical devices and their packaging fabricated in a polycrystalline 3C silicon carbide (poly-SiC) thin-film encapsulation process. In this fabrication technique, devices are sealed with a nominally 2-??m low-pressure chemical vapor deposition poly-SiC, and the device layer is simultaneously coated with a nominally 0.2- ??m poly-SiC thin film. Device characterization includes measurement of the resonant frequency and the quality factor of double-ended tuning-fork micromechanical resonators, which have a Si-SiC composite beam structure. Experimental results show that the pressure inside the packaging can be controlled from 447 Pa to 15.5 kPa with a 400??C annealing process. The frequency drifts of the encapsulated resonators are less than the frequency noise level (??10.6 ppm) measured over 29 days at 84.6??C ??0.1??C, which suggests that the poly-SiC thin-film packaging technique can offer hermetic packaging for various applications in microelectromechanical systems including inertial sensors. In addition to the packaging performance, the temperature coefficient of Young´s modulus for poly-SiC is derived from the resonant-frequency change of resonators with temperature. The reduction of the quality factor due to the poly-SiC coating, predicted in the theoretical model, is confirmed by measurements.
Keywords :
Q-factor; encapsulation; hermetic seals; micromechanical resonators; semiconductor device packaging; silicon compounds; wide band gap semiconductors; Si-SiC; Young\´s modulus; composite beam structure; device characterization; device layer; double-ended tuning-fork micromechanical resonators; encapsulated micromechanical resonators; encapsulated resonators; frequency drifts; frequency noise level; hermetic packaging; inertial sensors; low-pressure chemical vapor deposition; microelectromechanical systems; polycrystalline 3C silicon carbide; pressure 15.5 kPa; pressure 447 Pa; quality factor; resonant frequency; resonant-frequency change; sealed microelectromechanical devices; temperature 400 C; thin-film encapsulation process; thin-film packaging technique; $Q$ factor; Frequency; packaging; resonators; silicon carbide (SiC); stability;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2010.2040460