DocumentCode :
1418887
Title :
Simple Matrix-Method Modeling for Avalanche Photodetectors With Arbitrary Layer Structures and Absorption/Multiplication Coefficients
Author :
Dai, Daoxin ; Bowers, John E.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of California at Santa Barbara, Santa Barbara, CA, USA
Volume :
28
Issue :
9
fYear :
2010
fDate :
5/1/2010 12:00:00 AM
Firstpage :
1404
Lastpage :
1413
Abstract :
A simple matrix-method model is presented for calculating the impedance and the short-circuit frequency response of an avalanche photodiode (APD) with arbitrary layer structures and absorption/multiplication coefficients. In our matrix method model, the depletion region of the APD is divided into many thin layers. In each thin layer the absorption and the multiplication coefficients are assumed to be uniform. As an example, we use this matrix-method model to analyze in detail a resonant Ge/Si SACM (separated absorption charge multiplication) APD. The impedance analysis shows that the avalanche region is equivalent to an LCR-circuit including a negative resistance, an inductance with a series resistance, and a capacitance in parallel connection. At higher bias voltages, the negative resistance and series resistance become very small and consequently the LCR circuit shows a strong resonance. Furthermore, the inductance also becomes smaller at higher bias voltages, which introduces a higher resonance frequency. This increases the 3 dB-bandwidth, in agreement with experiment.
Keywords :
Ge-Si alloys; RLC circuits; absorption coefficients; avalanche photodiodes; electric impedance; equivalent circuits; matrix algebra; photodetectors; Ge-Si; LCR circuit; absorption coefficients; arbitrary layer structure; avalanche photodetector; avalanche photodiode; impedance; matrix method modeling; multiplication coefficients; negative resistance; separated absorption charge multiplication; series resistance; short circuit frequency response; Avalanche photodiode; frequency response; impedance; matrix-method; negative resistance;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2010.2042279
Filename :
5415582
Link To Document :
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