DocumentCode :
1420457
Title :
Debye Length and Active Layer Thickness-Dependent Performance Variations of Amorphous Oxide-Based TFTs
Author :
Jeong, Jaewook ; Hong, Yongtaek
Author_Institution :
Div. of Nano & Bio Technol., Daegu Gyeongbuk Inst. of Sci. & Technol., Daegu, South Korea
Volume :
59
Issue :
3
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
710
Lastpage :
714
Abstract :
We analyzed the active layer thickness-dependent performance variations of amorphous oxide-based semiconductor thin-film transistors (AOS TFTs), which are typically operated in depletion mode by using an ATLAS 2-D device simulator. The negative shift of threshold voltage was originated from increasing the amount of intrinsic carrier as active layer thickness is increased. On the contrary, off-current level was a function of Debye length, which is in inverse proportion to the square root of carrier density and the amount of valence band deep states, as well as active layer thickness. Therefore, the relation between Debye length and active layer thickness determines the off-current level, which also enables to explain the off-current behavior of AOS TFTs under light illumination.
Keywords :
carrier density; semiconductor device models; thin film transistors; ATLAS 2D device simulator; Debye length; active layer thickness; amorphous oxide-based semiconductor thin-film transistors; carrier density; depletion mode; intrinsic carrier; light illumination; negative shift; performance variations; threshold voltage; valence band deep states; Charge carrier density; Educational institutions; Neodymium; Performance evaluation; Thin film transistors; Threshold voltage; Amorphous indium–gallium–zinc–oxide (a-IGZO); off current; oxide based; simulation; thin-film transistor (TFT); threshold voltage shift;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2180908
Filename :
6129495
Link To Document :
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