DocumentCode :
142266
Title :
The alternative algorithm for the determination of threshold voltages on N-channel Fin-FET devices
Author :
Hsin-Chia Yang ; Cheng-Yu Tsai ; Ko-Fan Liao ; Wen-Shang Liao ; Fang Hsu ; Sung-Ching Chi
Author_Institution :
Dept. of Electron. Eng., Minghsin Univ. of Sci. & Technol., Hsinchu, Taiwan
Volume :
3
fYear :
2014
fDate :
26-28 April 2014
Firstpage :
2084
Lastpage :
2087
Abstract :
FINFET devices have generated an alternative convincing next-generation foundation in IC industry. The outrageously leaky Ioff current gets controlled as the channel length is imperatively shortened down to 40nm and below. Somehow, the 3-dimensional fin structure makes itself distinct from the traditional MOSFET transistors, e.g., the threshold voltages (Vt). In some channel lengths, Vt may turn to be negative on NFINFET, while it may turn to be positive on PFINFET. It is intriguing to use or propose another reliable way to determine threshold voltages. In this study, a reliable and direct way is proposed using modeled current-voltage characteristic curves to fit measured ones. After fitting, some other physical quantities can be simultaneously determined giving persuasive understanding on the devices.
Keywords :
MOSFET; leakage currents; silicon-on-insulator; 3D Fin structure; MOSFET transistors; N-channel Fin-FET devices; NFINFET; PFINFET; channel length; current-voltage characteristic curves; size 40 nm; threshold voltages; FinFETs; Fitting; Logic gates; Silicon-on-insulator; Temperature; Threshold voltage; 3-D Fin Structure; Fin-FET Devices; Leakage current; Over Etching; Over Exposure;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Information Science, Electronics and Electrical Engineering (ISEEE), 2014 International Conference on
Conference_Location :
Sapporo
Print_ISBN :
978-1-4799-3196-5
Type :
conf
DOI :
10.1109/InfoSEEE.2014.6946291
Filename :
6946291
Link To Document :
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