DocumentCode
1423819
Title
Device and IC Characterization Above 100 GHz
Author
Yau, Kenneth H K ; Dacquay, Eric ; Sarkas, Ioannis ; Voinigescu, Sorin P.
Author_Institution
ECE Dept., Univ. of Toronto, Toronto, ON, Canada
Volume
13
Issue
1
fYear
2012
Firstpage
30
Lastpage
54
Abstract
Due to the aggressive scaling of metal-oxide-semiconductor field-effect transistors (MOSFETs) and silicon germanium SiGe heterojunction bipolar transistors (HBTs), silicon-based circuits operating above 100 GHz are becoming a reality. However, at present, most, if not all semiconductor foundries extract their transistor and passive device models from measurements conducted below 110 GHz and often below 65 GHz. In order to reduce the number of design iterations, accurate S-parameter characterization techniques above 100 GHz are required for active and passive devices such that compact models may be developed and verified on representative circuits.
Keywords
MOSFET; S-parameters; elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; silicon; silicon compounds; HBT; IC characterization; MOSFET; S-parameter characterization technique; Si; SiGe; heterojunction bipolar transistor; metal-oxide-semiconductor field-effect transistor; silicon-based circuit; Foundries; Frequency measurement; Heterojunction bipolar transistors; Integrated circuit modeling; Scattering parameters; Semiconductor device measurement; Silicon germanium;
fLanguage
English
Journal_Title
Microwave Magazine, IEEE
Publisher
ieee
ISSN
1527-3342
Type
jour
DOI
10.1109/MMM.2011.2173869
Filename
6132311
Link To Document