DocumentCode
1423974
Title
Fatigue Insensitivity of Nanoscale Freestanding Aluminum Films
Author
Kumar, Sandeep ; Alam, Md Tarekul ; Haque, M.A.
Author_Institution
Mech. & Nucl. Eng. Dept., Pennsylvania State Univ., University Park, PA, USA
Volume
20
Issue
1
fYear
2011
Firstpage
53
Lastpage
58
Abstract
We demonstrate a microelectromechanical-system-based setup for fatigue studies on 200-nm-thick freestanding aluminum specimens in situ inside the transmission electron microscope. The specimens did not show any sign of fatigue damage even at 1.2 ×106 cycles under nominal stresses about 80% of the static ultimate strength. We show direct evidence to propose that the conventional theory of fatigue crack nucleation through slip bands does not work for nanoscale freestanding thin films, which gives rise to the anomalous fatigue insensitivity.
Keywords
aluminium; fatigue cracks; micromechanical devices; thin films; transmission electron microscopes; anomalous fatigue insensitivity; fatigue crack nucleation; microelectromechanical-system-based setup; nanoscale freestanding aluminum films; nanoscale freestanding thin films; size 200 nm; slip bands; transmission electron microscope; Electron microscopy; fatigue; microelectromechanical devices; thin films;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2010.2100033
Filename
5685789
Link To Document