• DocumentCode
    1423974
  • Title

    Fatigue Insensitivity of Nanoscale Freestanding Aluminum Films

  • Author

    Kumar, Sandeep ; Alam, Md Tarekul ; Haque, M.A.

  • Author_Institution
    Mech. & Nucl. Eng. Dept., Pennsylvania State Univ., University Park, PA, USA
  • Volume
    20
  • Issue
    1
  • fYear
    2011
  • Firstpage
    53
  • Lastpage
    58
  • Abstract
    We demonstrate a microelectromechanical-system-based setup for fatigue studies on 200-nm-thick freestanding aluminum specimens in situ inside the transmission electron microscope. The specimens did not show any sign of fatigue damage even at 1.2 ×106 cycles under nominal stresses about 80% of the static ultimate strength. We show direct evidence to propose that the conventional theory of fatigue crack nucleation through slip bands does not work for nanoscale freestanding thin films, which gives rise to the anomalous fatigue insensitivity.
  • Keywords
    aluminium; fatigue cracks; micromechanical devices; thin films; transmission electron microscopes; anomalous fatigue insensitivity; fatigue crack nucleation; microelectromechanical-system-based setup; nanoscale freestanding aluminum films; nanoscale freestanding thin films; size 200 nm; slip bands; transmission electron microscope; Electron microscopy; fatigue; microelectromechanical devices; thin films;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2010.2100033
  • Filename
    5685789