Title :
Top-Gated Epitaxial Graphene FETs on Si-Face SiC Wafers With a Peak Transconductance of 600 mS/mm
Author :
Moon, J.S. ; Curtis, D. ; Bui, S. ; Hu, M. ; Gaskill, D.K. ; Tedesco, J.L. ; Asbeck, P. ; Jernigan, G.G. ; VanMil, B.L. ; Myers-Ward, R.L. ; Eddy, C.R., Jr. ; Campbell, P.M. ; Weng, X.
Author_Institution :
HRL Labs., LLC, Malibu, CA, USA
fDate :
4/1/2010 12:00:00 AM
Abstract :
In this letter, we present state-of-the-art performance of top-gated graphene n-FETs and p-FETs fabricated with epitaxial graphene layers grown on Si-face 6H-SiC substrates on 50-mm wafers. The current-voltage characteristics of these devices show excellent saturation with on-state current densities (Ion) of 0.59 A/mm at Vds = 1 V and 1.65 A/mm at Vds = 3 V. Ion/Ioff ratios of 12 and 19 were measured at Vds = 1 and 0.5 V, respectively. A peak extrinsic gm as high as 600 mS/mm was measured at Vds = 3.05 V, with a gate length of 2.94 ??m. The field-effect mobility versus effective electric field (Eeff) was measured for the first time in epitaxial graphene FETs, where record field-effect mobilities of 6000 cm2/V??s for electrons and 3200 cm2/V??s for holes were obtained at Eeff ~ 0.27 MV/cm .
Keywords :
field effect transistors; graphene; silicon compounds; SiC; effective electric field; field-effect mobility; size 2.94 mum; size 50 mm; top-gated epitaxial graphene FET; voltage 0.5 V; voltage 1 V; voltage 3.05 V; Field-effect mobility; Si MOSFET; graphene; n-FET; p-FET; transistor;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2040132