DocumentCode :
1432358
Title :
Tri-Gate Normally-Off GaN Power MISFET
Author :
Lu, Bin ; Matioli, Elison ; Palacios, Tomás
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
Volume :
33
Issue :
3
fYear :
2012
fDate :
3/1/2012 12:00:00 AM
Firstpage :
360
Lastpage :
362
Abstract :
We present a new normally-off GaN transistor-the tri-gate normally-off GaN metal-insulator-semiconductor field- effect transistor (MISFET). Due to the excellent channel control of a new 3-D gate structure, a breakdown voltage of 565 V has been achieved at a drain leakage current of 0.6 μA/mm and Vgs = 0. The new device has an on/off current ratio of more than eight orders of magnitude and a subthreshold slope of 86 ± 9 mV/decade. The threshold voltage of the new device is 0.80 ± 0.06 V with a maximum drain current of 530 mA/mm. These results confirm the great potential of the tri-gate normally-off GaN-on-Si MISFETs for the next generation of power electronics.
Keywords :
III-V semiconductors; MISFET; gallium compounds; leakage currents; power MOSFET; wide band gap semiconductors; 3D gate structure; GaN; drain current; drain leakage current; metal-insulator-semiconductor field-effect transistor; on/off current ratio; subthreshold slope; threshold voltage; tri-gate normally-off power MISFET; voltage 565 V; Aluminum gallium nitride; Gallium nitride; HEMTs; Leakage current; Logic gates; MISFETs; GaN transistor; normally-off; power electronics; tri-gate;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2179971
Filename :
6140542
Link To Document :
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