Design of a microengineered electrostatic quadrupole lens

Author

Syms, Richard R A ; Tate, Thomas J. ; Ahmad, Munir M. ; Taylor, Stephen

Author_Institution

Dept. of Electr. & Electron. Eng., Imperial Coll., London, UK

Volume

45

Issue

11

fYear

1998

fDate

11/1/1998 12:00:00 AM

Firstpage

2304

Lastpage

2311

Abstract

The design of a miniature quadrupole lens based on metallized glass electrodes mounted in two anisotropically etched silicon mounts that are separated by precision spacers is described. The analysis of conventional quadrupole lenses is first reviewed. The fabrication process is then described, and the analysis techniques are applied to the new geometry. The potential distribution near the axis is first calculated using a finite difference method. Expansion into solutions of Laplace´s equation in cylindrical coordinates is then used to determine the potential distortion introduced by the microengineered mount. Design rules are given for a mount and an electrode radius that achieve minimal distortion

Keywords

Laplace equations; electrostatic lenses; etching; finite difference methods; mass spectrometers; microelectrodes; micromachining; silicon; voltage distribution; Laplace equation; Si; anisotropically etched Si mounts; cylindrical coordinates; design rules; electrode radius; fabrication process; finite difference method; metallized glass electrodes; microengineered electrostatic quadrupole lens; potential distortion; potential distribution; precision spacers; Anisotropic magnetoresistance; Electrodes; Electrostatics; Etching; Fabrication; Glass; Lenses; Metallization; Optical design; Silicon;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.726645

Filename

726645