Title :
Initiation of arc cathode emission in Cu2O films
Author :
Rageh, M.S.I. ; Guile, A.E. ; Morgan, D.V. ; Hitchcock, A.H.
Author_Institution :
University of Leeds, Department of Electrical & Electronic Engineering, Leeds, UK
fDate :
1/1/1978 12:00:00 AM
Abstract :
Experiments on Cu2O films over a wide thickness range are described in which three techniques have been used: (a) photo-electron-emission measurements in vacuum (b) I/V characteristics using a metal top electrode on the film (c) surface potential-difference measurements. These results have been correlated with scanning electron-micro-scope studies of copper-arc cathode microstructure to give new data on the initiation of electron emission. Ultra-violet radiation is shown to make possible switching times as low as 1 ns by increasing the electrical conductivity of the oxide film, but the electric field across the oxide required to produce switching depends on positive ion charging.
Keywords :
arcs (electric); copper compounds; electron emission; insulating thin films; photoemission; Cu arc cathode microstructure; Cu2O films; arc cathode emission; electron emission; insulating thin film;
Journal_Title :
Electrical Engineers, Proceedings of the Institution of
DOI :
10.1049/piee.1978.0024