• DocumentCode
    144755
  • Title

    Fabrication and testing of solution-processed carbon nanotube thin film transistor

  • Author

    Xun Yi ; Liang Fang ; Yaqing Chi ; Bingcai Sui

  • Author_Institution
    State Key Lab. of High Performance Comput., Nat. Univ. of Defense Technol., Changsha, China
  • Volume
    2
  • fYear
    2014
  • fDate
    26-28 April 2014
  • Firstpage
    1171
  • Lastpage
    1175
  • Abstract
    We described fabrication and testing of solution-processed SWCNT TFTs. A back-gated TFT test structure was fabricated by drop-coating SWCNT solution on SiO2 surface with Au electrodes. Output characteristic and switching characteristic were measured and analyzed. Over 4 decades´ on/off ratio was obtained by using drop-coating at room temperature without any further optimization. Although we use a back-gated test structure, gate leak current was estimated at the level of picoampere. The resultant mobility level was 2×10-3 cm2 V-1s-1, which is potential for future applications.
  • Keywords
    carbon nanotube field effect transistors; electrochemical electrodes; gold; leakage currents; protective coatings; thin film transistors; Au; Au electrodes; C; SWCNT TFT; SiO2; back-gated TFT test structure; back-gated test structure; carbon nanotube thin film transistor; drop coating; drop-coating SWCNT solution; gate leak current; resultant mobility level; temperature 293 K to 298 K; Electrodes; Equations; Logic gates; Semiconductor device measurement; Switches; Thin film transistors; Threshold voltage; Carbon Nanotube; Gate Leakage; Solution Process; Thin Film Transistor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Information Science, Electronics and Electrical Engineering (ISEEE), 2014 International Conference on
  • Conference_Location
    Sapporo
  • Print_ISBN
    978-1-4799-3196-5
  • Type

    conf

  • DOI
    10.1109/InfoSEEE.2014.6947855
  • Filename
    6947855