DocumentCode :
1450212
Title :
Quantifying neutral base recombination and the effects of collector-base junction traps in UHV/CVD SiGe HBTs
Author :
Niu, Guofu ; Cressler, John D. ; Joseph, Alvin J.
Author_Institution :
Dept. of Electr. Eng., Auburn Univ., AL, USA
Volume :
45
Issue :
12
fYear :
1998
fDate :
12/1/1998 12:00:00 AM
Firstpage :
2499
Lastpage :
2504
Abstract :
This work quantifies neutral base recombination in UHV/CVD SiGe heterojunction bipolar transistors (HBTs) using calibrated two-dimensional (2-D) simulation. The simulated collector-base conductance through neutral base recombination (NBR) modulation is far below the experimentally observed values, and hence does not explain the measured output resistance degradation under forced-IB operation. In spite of the output resistance degradation, these UHV/CVD SiGe HBTs have approximately the same base current as the silicon control, and hence higher current gain. Based on the observation of the majority carrier concentration limited recombination in the CB junction depletion layer, as opposed to the minority carrier concentration limited recombination in the neutral base, local presence of traps in the CB junction depletion layer is suggested. This explains the measured CB conductance modulation and the related output resistance degradation without compromising the current gain. Numerical simulations using traps locally introduced into the CB junctions successfully reproduced the measured collector-base conductance from simulation without appreciable degradation in current gain
Keywords :
CVD coatings; Ge-Si alloys; carrier density; electron traps; electron-hole recombination; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; CB conductance modulation; SiGe; UHV/CVD SiGe HBT; base current; collector-base junction traps; current gain; depletion layer; heterojunction bipolar transistor; majority carrier concentration; minority carrier concentration; neutral base recombination; output resistance; two-dimensional numerical simulation; Current measurement; Degradation; Electrical resistance measurement; Force measurement; Gain measurement; Germanium silicon alloys; Heterojunction bipolar transistors; Numerical simulation; Silicon germanium; Two dimensional displays;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.735727
Filename :
735727
Link To Document :
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