Title :
Internal Temperature Extraction in Phase-Change Memory Cells During the Reset Operation
Author :
Boniardi, Mattia ; Redaelli, Andrea ; Tortorelli, Innocenzo ; Pellizzer, Fabio ; Pirovano, Agostino
Author_Institution :
Process R&DGroup, Micron Semicond. Italia, Agrate Brianza, Italy
fDate :
4/1/2012 12:00:00 AM
Abstract :
The phase-change memory technology is based on a chalcogenide compound able to reversibly switch between two stable states, namely, an amorphous high-resistive state and a crystalline low-resistive one, enabling the storage of the logical bit. Such phase transition is made by electrical pulses delivered to the memory cell, able to force a temperature raise within the material and to allow the temperature conditions required for the phase change. The cell internal temperature needs accurate control, and the evaluation of the thermal resistance of the memory cell represents a milestone to develop thermally efficient cell architectures and to gain insights into the thermal properties of the phase-change material. An experimental method for cell internal temperature evaluation has been developed and then supported by the electrothermal simulation of the cell behavior during the program operation, allowing for scaling predictions.
Keywords :
amorphous semiconductors; phase change materials; phase change memories; amorphous high-resistive state; cell behavior; cell internal temperature evaluation; chalcogenide compound; crystalline low-resistive state; electrical pulses; electrothermal simulation; internal temperature extraction; logical bit storage; phase transition; phase-change material; phase-change memory cells; phase-change memory technology; program operation; reset operation; scaling predictions; stable states; temperature conditions; temperature raise; thermal property; thermal resistance; thermally efficient cell architectures; Phase change materials; Phase change memory; Temperature; Temperature measurement; Thermal resistance; Chalcogenide materials; GeSbTe (GST) alloys; melting temperature; phase change memory; scaling analysis; thermal resistance;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2012.2185674