DocumentCode
1461618
Title
Crystallization Behavior of the AgInSbTe Film
Author
Chen, Shi-Wei ; Yang, Chin-Tien ; Chiang, Donyau
Author_Institution
Sci. Res. Div., Nat. Synchrotron Radiat. Res. Center, Hsinchu, Taiwan
Volume
47
Issue
3
fYear
2011
fDate
3/1/2011 12:00:00 AM
Firstpage
551
Lastpage
555
Abstract
The sputtered films of Ag4 3In6.2Te30.5Sb60 nominal composition subjected to the various laser powers treatment from the initializer are analyzed. The degree of crystallization of this sputtered film is significantly dependent on the laser powers. Extended X-ray absorption fine structure (EXAFS) spectra indicate that, before initialization, the bonding distance between each element atom and the neighbor atoms maintains a fixed value roughly close to that in the crystal structure. It indicates the existence of short-range ordering in the amorphous structure of the film. The phase transformation of this alloy film can be processed just through a quite short displacement of atoms from the amorphous frame to the corresponding crystalline frame; consequently fast phase change is achieved. The discs of proper designed layer structure and initialization power treatment have excellent direct overwriting performance.
Keywords
EXAFS; amorphisation; antimony alloys; crystal structure; crystallisation; indium alloys; laser materials processing; metallic thin films; noncrystalline structure; short-range order; silver alloys; sputter deposition; tellurium alloys; Ag4.3In6.2Te30.5Sb60; EXAFS; amorphous structure; bonding distance; crystal structure; crystallization; element atom; extended X-ray absorption fine structure spectra; initialization power treatment; laser powers treatment; phase transformation; short-range ordering; sputtered films; Absorption; Crystallization; Jitter; Metals; Power lasers; AgInTeSb sputtered film; direct overwriting; initialization power; short-range ordering; synchrotron light; uncompleted crystallization phenomenon;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2010.2098855
Filename
5721810
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