DocumentCode
1463692
Title
Limitations and challenges of computer-aided design technology for CMOS VLSI
Author
Bryant, Randal E. ; Cheng, Kwang-Ting ; Kahng, Andrew B. ; Keutzer, Kurt ; Maly, Wojciech ; Newton, Richard ; Pileggi, Lawrence ; Rabaey, Jan M. ; Sangiovanni-Vincentelli, Alberto
Author_Institution
Dept. of Comput. Sci., Carnegie Mellon Univ., Pittsburgh, PA, USA
Volume
89
Issue
3
fYear
2001
fDate
3/1/2001 12:00:00 AM
Firstpage
341
Lastpage
365
Abstract
As manufacturing technology moves toward fundamental limits of silicon CMOS processing, the ability to reap the full potential of available transistors and interconnect is increasingly important. Design technology (DT) is concerned with the automated or semi-automated conception, synthesis, verification, and eventual testing of microelectronic systems. While manufacturing technology faces fundamental limits inherent in physical laws or material properties, design technology faces fundamental limitations inherent in the computational intractability of design optimizations and in the broad and unknown range of potential applications within various design processes. In this paper, we explore limitations to how design technology can enable the implementation of single-chip microelectronic systems that take full advantage of manufacturing technology with respect to such criteria as layout density performance, and power dissipation
Keywords
CMOS digital integrated circuits; VLSI; circuit CAD; circuit layout CAD; circuit optimisation; design for testability; high level synthesis; integrated circuit design; integrated circuit testing; mixed analogue-digital integrated circuits; timing; ASIC; CAD technology; CMOS VLSI; DFT; IC design process; Si; Si CMOS ICs; automated synthesis; computer-aided design technology; design optimizations; integrated circuit design process; layout density performance; power dissipation; single-chip microelectronic systems; testing; verification; Automatic testing; CMOS process; CMOS technology; Computer aided manufacturing; Design automation; Manufacturing processes; Material properties; Microelectronics; Silicon; System testing;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/5.915378
Filename
915378
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