• DocumentCode
    1464360
  • Title

    Breakdown Current Density of CVD-Grown Multilayer Graphene Interconnects

  • Author

    Lee, Kyeong-Jae ; Chandrakasan, Anantha P. ; Kong, Jing

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • Volume
    32
  • Issue
    4
  • fYear
    2011
  • fDate
    4/1/2011 12:00:00 AM
  • Firstpage
    557
  • Lastpage
    559
  • Abstract
    Graphene wires have been fabricated from large-area multilayer graphene sheets grown by chemical vapor deposition. As the methane concentration increases, a larger percentage of thicker graphene layers are grown. The multilayer graphene sheets have an average thickness of 10-20 nm with sheet resistances between 500 and 1000 Ω/sq. The sheet resistance shows a strong correlation with the average surface roughness. This letter reports measured breakdown current densities up to 4×107 A/cm2, where resistive heating is proposed as the main breakdown mechanism. Increasing the uniformity of the graphene layers is important in achieving a higher breakdown current density.
  • Keywords
    chemical vapour deposition; current density; graphene; interconnections; surface roughness; C; breakdown current density; chemical vapor deposition; graphene wires; methane concentration; multilayer graphene interconnects; multilayer graphene sheets; resistive heating; surface roughness; Conductivity; Current density; Electric breakdown; Electrical resistance measurement; Nonhomogeneous media; Resistance; Wires; Current density; graphene; interconnect;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2108259
  • Filename
    5723686