DocumentCode
1486895
Title
Effect of interface roughness and polarisation on the optical losses of porous silicon-based waveguides
Author
Charrier, Jean-Philippe ; Dumeige, Yannick ; Pirasteh, P. ; Gadonna, M.
Author_Institution
FOTON, Univ. Eur. de Bretagne, Lannion, France
Volume
7
Issue
3
fYear
2012
fDate
3/1/2012 12:00:00 AM
Firstpage
275
Lastpage
278
Abstract
Optical losses measurements were performed at 1550 nm on both porous silicon (PSi) and oxidised PSi (OPSi) planar waveguides as a function of interface roughness. The PSi waveguides were produced at different anodisation temperatures to reduce the interface roughness. The authors noticed a decrease in optical losses with the diminution of roughness. The lowest value of optical losses was equal to 0.5 dB/cm and obtained for OPSi waveguide with a 10 nm interface roughness and anodisation temperature equal to 20 C. The surface scattering losses were modelled. There is a good agreement between the theoretical and experimental values. The optical losses were also carried out in transverse electric (TE) and transverse magnetic (TM) polarisations for both PSi and oxidised OPSi waveguides.
Keywords
anodisation; light polarisation; optical losses; optical planar waveguides; anodisation temperatures; interface roughness; optical losses measurements; porous silicon-based planar waveguides; surface scattering losses; transverse electric polarisations; transverse magnetic polarisations; wavelength 1550 nm;
fLanguage
English
Journal_Title
Micro & Nano Letters, IET
Publisher
iet
ISSN
1750-0443
Type
jour
DOI
10.1049/mnl.2012.0027
Filename
6179261
Link To Document