• DocumentCode
    1486895
  • Title

    Effect of interface roughness and polarisation on the optical losses of porous silicon-based waveguides

  • Author

    Charrier, Jean-Philippe ; Dumeige, Yannick ; Pirasteh, P. ; Gadonna, M.

  • Author_Institution
    FOTON, Univ. Eur. de Bretagne, Lannion, France
  • Volume
    7
  • Issue
    3
  • fYear
    2012
  • fDate
    3/1/2012 12:00:00 AM
  • Firstpage
    275
  • Lastpage
    278
  • Abstract
    Optical losses measurements were performed at 1550 nm on both porous silicon (PSi) and oxidised PSi (OPSi) planar waveguides as a function of interface roughness. The PSi waveguides were produced at different anodisation temperatures to reduce the interface roughness. The authors noticed a decrease in optical losses with the diminution of roughness. The lowest value of optical losses was equal to 0.5 dB/cm and obtained for OPSi waveguide with a 10 nm interface roughness and anodisation temperature equal to 20 C. The surface scattering losses were modelled. There is a good agreement between the theoretical and experimental values. The optical losses were also carried out in transverse electric (TE) and transverse magnetic (TM) polarisations for both PSi and oxidised OPSi waveguides.
  • Keywords
    anodisation; light polarisation; optical losses; optical planar waveguides; anodisation temperatures; interface roughness; optical losses measurements; porous silicon-based planar waveguides; surface scattering losses; transverse electric polarisations; transverse magnetic polarisations; wavelength 1550 nm;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2012.0027
  • Filename
    6179261