DocumentCode :
1489823
Title :
Physical and electro-chemical properties of high rate ion-beam sputtered Fe films
Author :
Lo, Jerry ; Franco, L. ; Huang, T.C. ; Wu, T.W. ; Miller, D. ; Campbell, R.
Volume :
24
Issue :
6
fYear :
1988
fDate :
11/1/1988 12:00:00 AM
Firstpage :
3081
Lastpage :
3083
Abstract :
Magnetic properties, resistivity, hardness, and corrosion resistance of nitrogen-doped iron films deposited using an ion-beam sputter system are reported. It was found that longer ion source idling time and higher nitrogen doping generates films with lower coercivities, lower anisotropy fields, and finer grain size for nitrogen concentration less than 3 at.%. The nitrogen in the films is chemically bonded to iron with photoelectron binding energy of 397.2 eV. For nitrogen concentrations ⩾5 at.%, near-zero saturation magnetostriction, fine grain size, high saturation magnetization, 60 μΩ-cm resistivity, 20 GPa hardness, and corrosion resistance higher than that of NiFe were obtained
Keywords :
coercive force; corrosion; electronic conduction in metallic thin films; ferromagnetic properties of substances; hardness; iron; magnetic anisotropy; magnetic thin films; magnetostriction; nitrogen; sputtered coatings; Fe:N films; anisotropy fields; coercivities; corrosion resistance; grain size; hardness; ion source idling time; ion-beam sputter system; photoelectron binding energy; resistivity; saturation magnetization; saturation magnetostriction; Coercive force; Conductivity; Corrosion; Doping; Grain size; Ion sources; Iron; Magnetic films; Magnetic properties; Nitrogen;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.92341
Filename :
92341
Link To Document :
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