DocumentCode
1493547
Title
Experimental Method to Extract Effective Channel Length of Nanoscale n-MOSFETs
Author
Lee, Nam-Hyun ; Choi, Hwan-Wook ; Kang, Heesung ; Kang, Bongkoo
Author_Institution
Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
Volume
30
Issue
11
fYear
2009
Firstpage
1191
Lastpage
1193
Abstract
An experimental method of extracting the effective channel length Leff from measured gate tunneling current (Ig) of nanoscale n-MOSFETs is proposed. The tunneling current from gate to the source and drain (Igsd) was measured while applying a reverse bias to the substrate, and it was corrected for the depletion effect of the source/drain junctions. The gate tunneling current to the substrate (Igc) was obtained by subtracting Igsd from Ig. Leff was calculated using a linear extrapolation of the Igc versus gate length plot. The proposed method is a very simple and quite accurate method of extracting Leff which does not require any additional assumptions and parameter extraction.
Keywords
MOSFET; extrapolation; nanoelectronics; semiconductor junctions; tunnelling; depletion effect; effective channel length; gate tunneling current; linear extrapolation; nanoscale n-MOSFET; parameter extraction; source-drain junctions; Effective channel length; MOSFET; gate tunneling current; gate-source/drain overlap length;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2030907
Filename
5280281
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