• DocumentCode
    1493547
  • Title

    Experimental Method to Extract Effective Channel Length of Nanoscale n-MOSFETs

  • Author

    Lee, Nam-Hyun ; Choi, Hwan-Wook ; Kang, Heesung ; Kang, Bongkoo

  • Author_Institution
    Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
  • Volume
    30
  • Issue
    11
  • fYear
    2009
  • Firstpage
    1191
  • Lastpage
    1193
  • Abstract
    An experimental method of extracting the effective channel length Leff from measured gate tunneling current (Ig) of nanoscale n-MOSFETs is proposed. The tunneling current from gate to the source and drain (Igsd) was measured while applying a reverse bias to the substrate, and it was corrected for the depletion effect of the source/drain junctions. The gate tunneling current to the substrate (Igc) was obtained by subtracting Igsd from Ig. Leff was calculated using a linear extrapolation of the Igc versus gate length plot. The proposed method is a very simple and quite accurate method of extracting Leff which does not require any additional assumptions and parameter extraction.
  • Keywords
    MOSFET; extrapolation; nanoelectronics; semiconductor junctions; tunnelling; depletion effect; effective channel length; gate tunneling current; linear extrapolation; nanoscale n-MOSFET; parameter extraction; source-drain junctions; Effective channel length; MOSFET; gate tunneling current; gate-source/drain overlap length;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2030907
  • Filename
    5280281