Title :
Cutoff frequency and propagation delay time of 1.5-nm gate oxide CMOS
Author :
Momose, Hisayo Sasaki ; Morifuji, Eiji ; Yoshitomi, Takashi ; Ohguro, Tatsuya ; Saito, Masanobu ; Iwai, Hiroshi
Author_Institution :
Toshiba Corp., Yokohama, Japan
fDate :
6/1/2001 12:00:00 AM
Abstract :
The high-frequency AC characteristics of 1.5-nm direct-tunneling gate SiO2 CMOS are described. Very high cutoff frequencies of 170 GHz and 235 GHz were obtained for 0.08-μm and 0.06-μm gate length nMOSFETs at room temperature. Cutoff frequency of 65 GHz was obtained for 0.15-μm gate length pMOSFETs using 1.5-nm gate SiO2 for the first time. The normal oscillations of the 1.5-nm gate SiO2 CMOS ring oscillators were also confirmed. In addition, this paper investigates the cutoff frequency and propagation delay time in recent small-geometry CMOS and discusses the effect of gate oxide thinning. The importance of reducing the gate oxide thickness in the direct-tunneling regime is discussed for sub-0.1-μm gate length CMOS in terms of high-frequency, high-speed operation
Keywords :
CMOS integrated circuits; delays; high-speed integrated circuits; low-power electronics; tunnelling; 0.06 micron; 0.08 micron; 0.15 micron; 1.5 nm; 170 GHz; 245 GHz; 65 GHz; Si-SiO2; cutoff frequency; direct-tunneling gate; gate oxide thinning; high-frequency AC characteristics; high-speed operation; propagation delay time; ring oscillators; small-geometry CMOS; Cutoff frequency; Insulation; Large scale integration; Leakage current; Logic; MOSFETs; Microprocessors; Propagation delay; Temperature; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on