• DocumentCode
    1503370
  • Title

    Time-Resolved Plasma Characteristics in a Short-Pulse High-Power Diode With a Dielectric Fiber (Velvet) Cathode

  • Author

    Yang, Jie ; Shu, Ting ; Zhang, Jun ; Fan, Yuwei ; Zhu, Jun

  • Author_Institution
    Nat. Univ. of Defense Technol. (NUDT), Changsha, China
  • Volume
    40
  • Issue
    6
  • fYear
    2012
  • fDate
    6/1/2012 12:00:00 AM
  • Firstpage
    1696
  • Lastpage
    1700
  • Abstract
    The dynamics of expanding cathode and anode plasmas has long been recognized as a limiting factor of high-power vacuum diodes. An investigation of the characteristics of plasmas in a planar explosive emission diode powered by a 275-kV, 110-ns pulse is presented. In addition to current and voltage measurements, an ultra fast framing camera was employed to study transient characteristics of the plasma instabilities. It was shown by optical diagnostics that the anode plasma was clearly visible for the velvet cathode. Moreover, the anode plasma expanded rapidly across the anode-cathode gap, and the light emitted from it was much more intensive than that from the cathode plasma. In particular, we find that plasma transit times from anode to cathode are hundreds of nanoseconds, a very distinct and experimentally observable phenomena described in this article.
  • Keywords
    plasma diagnostics; plasma diodes; plasma instability; plasma transport processes; anode plasma expansion; anode-cathode gap; dielectric fiber cathode; dielectric velvet cathode; expanding anode dynamics; expanding cathode dynamics; high-power vacuum diodes; limiting factor; optical diagnostics; planar explosive emission diode; plasma instabilities; plasma transit time; short-pulse high-power diode; time-resolved plasma characteristics; transient characteristics; ultrafast framing camera; voltage 275 kV; Acceleration; Anodes; Cameras; Cathodes; Educational institutions; Explosives; Plasmas; Anode; electron beams; high-speed framing camera (HSFC); plasma instabilities;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2012.2191800
  • Filename
    6189798