• DocumentCode
    1504063
  • Title

    Multiparameter Sensitivity Analysis of Multiple Coupled Vias in Board and Package Structures for Early Design and Optimization

  • Author

    Li, Ying ; Jandhyala, Vikram

  • Author_Institution
    Electr. Eng. Dept., Univ. of Washington, Seattle, WA, USA
  • Volume
    33
  • Issue
    4
  • fYear
    2010
  • Firstpage
    1003
  • Lastpage
    1011
  • Abstract
    Analytical expressions for the multiparametric sensitivity analysis of coupled-via S -parameters in board and package structures are derived in this paper. These expressions are validated with finite difference approximations of S-parameters obtained from three-dimensional field solvers and of the analytical expressions themselves. Sensitivity analysis with respect to multiple geometric and material variations provides quick early-design insight without resorting to complete three-dimensional field simulation. Sensitivities for eccentric effect of via drilling and exterior problem are also studied. First derivative data is also critical for gradient-based optimization of system-level performance which includes via-via coupling. The proposed approach is a stepping stone towards early design and optimization for large-scale via structures in microelectronics systems.
  • Keywords
    S-parameters; circuit optimisation; circuit simulation; coupled circuits; electronics packaging; finite difference methods; geometry; gradient methods; sensitivity analysis; three-dimensional integrated circuits; board structure; coupled-via S -parameter; drilling; eccentric effect; finite difference approximation; geometric variation; gradient-based optimization; material variation; microelectronics system; multiparameter sensitivity analysis; package structure; system-level performance; three-dimensional field simulation; three-dimensional field solver; via coupling; Analytical models; Context modeling; Design optimization; Drilling; Electromagnetic interference; Finite difference methods; Packaging; Sensitivity analysis; Solid modeling; Virtual manufacturing; Interconnects; scattering matrix; sensitivity analysis; vias;
  • fLanguage
    English
  • Journal_Title
    Advanced Packaging, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-3323
  • Type

    jour

  • DOI
    10.1109/TADVP.2010.2047723
  • Filename
    5473134