• DocumentCode
    1505594
  • Title

    Investigation of Affecting Factors on the Hardness of Fluorine-Containing Amorphous Carbon Film Coated by Pulsed-Plasma Ablation

  • Author

    Kawara, Shingo ; Hamajima, Eri ; Koizumi, Hiroyuki ; Kousaka, Hiroyuki ; Yamada, Kazuhiko ; Umehara, Noritsugu ; Arakawa, Yoshihiro

  • Author_Institution
    Dept. of Mech. Sci. & Eng., Nagoya Univ., Nagoya, Japan
  • Volume
    40
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    1820
  • Lastpage
    1828
  • Abstract
    Hardness control of fluorine-containing diamondlike carbon (F-DLC) film deposited by pulsed-plasma ablation (PPA) of polytetrafluoroethylene (PTFE) was investigated. During coating, one substrate was set at a downstream position (front position) in the direction of plasma acceleration from a PTFE block, whereas another substrate was set at a side position in the direction perpendicular to the plasma acceleration from the PTFE. A typical Raman spectrum of diamondlike carbon, including D and G peaks due to sp2 carbons, was observed only from the front substrate; on the other hand, such a spectrum was not clearly seen from the side substrate. The hardness of F-DLC was 5.7 GPa at the front position, whereas it was 0.4 GPa at the side position. These results indicated that the bombardment of accelerated plasma to the front substrate played an essential role to increase the film hardness. In order to further increase the hardness of F-DLC film with PPA, H2O addition to the chamber during coating was attempted. The hardness of F-DLC was increased up to 10.4 GPa at a chamber pressure of 5 10-4 torr obtained by H2O addition to the base pressure less than 0.4 10-4 torr.
  • Keywords
    Raman spectra; amorphous state; diamond-like carbon; hardness; plasma CVD coatings; thin films; C-F; F-DLC hardness; PTFE block; Raman spectrum; base pressure; chamber pressure; downstream position; fluorine-containing amorphous carbon film hardness; fluorine-containing diamondlike carbon film deposition; front position; front substrate analysis; plasma acceleration; polytetrafluoroethylene; pressure 0.0005 torr; pulsed-plasma ablation; Acceleration; Carbon; Coatings; Electrodes; Plasmas; Substrates; Water; $hbox{H}_{2}hbox{O}$ addition; Diamondlike carbon (DLC); fluorine-containing DLC (F-DLC); hardness; polytetrafluoroethylene (PTFE); pulsed-plasma ablation (PPA);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2012.2195033
  • Filename
    6192348