Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence

Author

Steffens, Kristen L. ; Sobolewski, Mark A.

Author_Institution

Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA

Volume

27

Issue

1

fYear

1999

fDate

2/1/1999 12:00:00 AM

Firstpage

74

Lastpage

75

Abstract

Planar laser-induced fluorescence was performed in the parallel-plate gaseous electronics conference reference cell to determine two-dimensional maps of the CF₂ radical in 89% CF ₄/11% O₂ chamber-cleaning plasmas. The spatial characteristics of the CF₂ density and of broadband optical emission were controlled by varying the current at the upper electrode by adjusting the impedance between the upper electrode and ground. The results suggest that electrical control of the current paths through the plasma could be used to control the spatial distribution of reactive chemical species, aiding in the optimization of chamber-cleaning plasmas

Keywords

fluorescence; free radicals; organic compounds; oxygen; photoluminescence; plasma CVD; plasma density; plasma diagnostics; plasma-wall interactions; surface cleaning; CF₂ radical; O₂; broadband optical emission; carbon tetrafluoride; chamber-cleaning plasmas; current paths; density; electrical control; parallel-plate gaseous electronics conference reference cell; planar laser-induced fluorescence; plasma spatial uniformity; reactive chemical species; spatial characteristics; spatial distribution; tetrafluoromethane-O₂ chamber-cleaning plasma; two-dimensional maps; upper electrode; Chemicals; Electrodes; Fluorescence; Gas lasers; Impedance; Optical control; Plasma chemistry; Plasma density; Plasma properties; Stimulated emission;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.763044

Filename

763044