• DocumentCode
    150680
  • Title

    An X to Ka-Band fully-integrated stacked power amplifier in 45 nm CMOS SOI technology

  • Author

    Helmi, S.R. ; Jing-Hwa Chen ; Mohammadi, Soheil

  • Author_Institution
    Purdue Univ., West Lafayette, IN, USA
  • fYear
    2014
  • fDate
    19-23 Jan. 2014
  • Firstpage
    74
  • Lastpage
    76
  • Abstract
    An X to Ka-Band fully-integrated power amplifier (PA) designed with 8 stacked transistors is implemented in a 45 nm CMOS SOI technology. The stacked configuration allows the PA to deliver high output power over a wide bandwidth while each transistor is biased under low drain-source voltage. At 18 GHz, the PA under a bias supply of 9.6 V measures a saturated output power PSAT and linear output power P1dB of 27 dBm (0.5 Watt) and 24.5 dBm, respectively, with a peak power-added efficiency PAE of 11.8%. For the frequencies measured from 10 to 32 GHz, the PSAT, and P1dB are above 23.9 dBm and 18.8 dBm, respectively.
  • Keywords
    CMOS integrated circuits; MMIC power amplifiers; field effect MMIC; silicon-on-insulator; CMOS SOI technology; Ka-band fully-integrated stacked power amplifier; PA; X-band fully-integrated stacked power amplifier; frequency 10 GHz to 32 GHz; low drain-source voltage; power 0.5 W; size 45 nm; stacked transistors; voltage 9.6 V; Broadband amplifiers; CMOS integrated circuits; CMOS technology; Power amplifiers; Power generation; Transistors; CMOS; SOI; broadband; stacked power amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon Monolithic Integrated Circuits in Rf Systems (SiRF), 2014 IEEE 14th Topical Meeting on
  • Conference_Location
    Newport Beach, CA
  • Type

    conf

  • DOI
    10.1109/SiRF.2014.6828520
  • Filename
    6828520