DocumentCode :
1507095
Title :
A method for the prediction of hot-carrier lifetime in floating SOI NMOSFETs
Author :
Maeda, Shigenobu ; Yamaguchi, Yasuo ; Kim, Il-Jung ; Joachim, Hans-Oliver ; Inoue, Yasuo ; Miyoshi, Hirokazu ; Yasuoka, Akihiko
Author_Institution :
ULSI Lab., Mitsubishi Electr. Corp., Hyogo, Japan
Volume :
44
Issue :
12
fYear :
1997
fDate :
12/1/1997 12:00:00 AM
Firstpage :
2200
Lastpage :
2206
Abstract :
A concept was presented for the prediction of the device lifetimes for the hot-carrier effect (hot-carrier lifetimes) in floating SOI MOSFETs. The concept is that hot-carrier lifetimes in floating SOI MOSFETs can be predicted by estimating the hole current. In order to verify the validity of this concept, the hole current was investigated using device simulation. The results showed that the ratio of the hole current to the drain current in a floating-body SOI MOSFET is approximately equal to the ratio of substrate current to drain current in a body-tied one. Based on this fact, a method for accurately predicting the hot-carrier lifetime in floating-body SOI MOSFETs was proposed. The hot-carrier lifetime predicted with this method agreed well with the experimental results. This study showed that only the drain current difference between floating and body-tied structures results in lifetime differences, and there is no special effect on hot-carrier degradation in floating SOI MOSFETs. In this prediction, therefore, floating SOI MOSFETs can be treated in the same way as bulk MOSFETs. Hot-carrier lifetimes in floating SOI MOSFETs can be predicted using the hole current, while substrate currents are used in bulk MOSFETs
Keywords :
MOSFET; carrier lifetime; hot carriers; silicon-on-insulator; Si; device simulation; drain current; floating SOI NMOSFET; floating-body SOI MOSFET; hole current estimation; hot-carrier degradation; hot-carrier lifetime prediction; n-channel MOSFET; substrate current; Bipolar transistors; Degradation; Hot carrier effects; Hot carriers; Laboratories; Life estimation; Lifetime estimation; MOSFET circuits; Silicon on insulator technology; Ultra large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.644636
Filename :
644636
Link To Document :
بازگشت