GMR in corrugated Co/Cu multilayers

Author

Maeda, Atsushi ; Tanuma, Toshio ; Kume, Minoru ; Shimizu, Ryu ; Doi, Atsumasa

Author_Institution

New Mater. Res. Center, Sanyo Electr. Co. Ltd., Osaka, Japan

Volume

33

Issue

5

fYear

1997

fDate

9/1/1997 12:00:00 AM

Firstpage

3535

Lastpage

3537

Abstract

A new corrugated material comprising antiferromagnetically coupled Co/Cu multilayers was prepared using V-grooved Si substrates. Scanning electron microscopy and X-ray diffraction observations indicate that the corrugated multilayers were successfully grown with the formation of smooth and clear interfaces. Magnetoresistance change with the sense current normal to the grooves was larger than that with the current parallel to the grooves. The MR enhancement due to the difference in measurement geometry increased as the width of the grooves decreased

Keywords

X-ray diffraction; antiferromagnetic materials; cobalt; copper; giant magnetoresistance; magnetic multilayers; scanning electron microscopy; Co-Cu; X-ray diffraction; antiferromagnetically coupled Co/Cu multilayers; corrugated Co/Cu multilayers; giant magnetoresistance; measurement geometry; scanning electron microscopy; Antiferromagnetic materials; Geometry; Giant magnetoresistance; Magnetic anisotropy; Magnetic materials; Magnetic multilayers; Nonhomogeneous media; Perpendicular magnetic anisotropy; Scanning electron microscopy; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.619489

Filename

619489