DocumentCode :
1529687
Title :
1.3-μm AlGaInAs buried-heterostructure lasers
Author :
Takemasa, K. ; Kubota, M. ; Munakata, T. ; Wada, H.
Author_Institution :
Opto-Electron. Labs., Oki Electr. Ind. Co. Ltd., Tokyo, Japan
Volume :
11
Issue :
8
fYear :
1999
Firstpage :
949
Lastpage :
951
Abstract :
1.3-μm AlGaInAs-InP strained multiple-quantumwell (MQW) buried-heterostructure (BH) lasers have been successfully fabricated. InP current blocking layers could be smoothly regrown using the simple HF pretreatment, although the etched active region includes Al-containing layers. The threshold current I/sub th/ was typically 11 mA for as-cleaved 350-μm-long devices, which is about 30% lower than that of the ridge laser counterparts. A maximum continuous-wave operating temperature as high as 155/spl deg/C was achieved. For the 200-μm-long device with the high-reflective-coated rear-facet, I/sub th/ was as low as 7.5 mA and characteristic temperature T0 was 80 K. The BH lasers also provided more circular far-field patterns and lower thermal resistances than for ridge lasers.
Keywords :
Debye temperature; III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; laser transitions; quantum well lasers; reflectivity; 1.3 mum; 11 mA; 155 C; 200 mum; 350 mum; 7.5 mA; 80 K; Al-containing layers; AlGaInAs buried-heterostructure lasers; AlGaInAs-InP; AlGaInAs-InP strained MQW buried-heterostructure lasers; HF pretreatment; InP current blocking layers; as-cleaved; characteristic temperature; circular far-field patterns; etched active region; high-reflective-coated rear-facet; lower thermal resistances; maximum continuous-wave operating temperature; ridge laser counterparts; smoothly regrown; threshold current; Electrons; Optical device fabrication; Optical materials; Quantum well devices; Quantum well lasers; Semiconductor lasers; Temperature; Thermal resistance; Threshold current; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.775309
Filename :
775309
Link To Document :
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