Title :
A General Procedure for Process Yield With Multiple Characteristics
Author_Institution :
Dept. of Ind. Manage., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Abstract :
In this paper, we present a general procedure for evaluating the process yield with multiple characteristics in semiconductor manufacturing processes. The proposed process yield indices can be applied for multivariate normal distribution data or multivariate non-normal distribution data. These indices provide an exact measure of the overall process yield. Also, we show how to calculate the approximate lower confidence bound for the true process yield by using the one-to-one correspondence between the proposed process yield index and the overall process yield. Three examples are used to demonstrate the performance of the proposed approach. The results show that our procedure for evaluating the process yield with multiple characteristics is an effective approach.
Keywords :
normal distribution; semiconductor technology; multiple characteristics; multivariate normal distribution data; process yield index; semiconductor manufacturing process; Companies; Costs; Gaussian distribution; Manufacturing industries; Manufacturing processes; Permission; Technology management; Lower confidence bound; multiple characteristics; process yield;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2010.2057264
