DocumentCode :
1536696
Title :
Microtechnology and microsystems in measurement applications
Author :
Wolffenbuffel, R.F. ; Van Mullem, Cees J.
Author_Institution :
Lab. of Eletron. Instrum., Delft Univ. of Technol., Netherlands
Volume :
4
Issue :
3
fYear :
2001
fDate :
9/1/2001 12:00:00 AM
Firstpage :
21
Lastpage :
23
Abstract :
Microtechnology has made inroads into metrology. MEMS structures in thermal RMS-to-DC conversion are at a mature stage. Many more applications are in their infancy and require more basic and applied research. Next to metrology, these may open doors to the higher performance instruments. A characteristic of MEMS is the reproducibility of the structure, which is important in metrology. Standard microelectronic processing and low-cost batch fabrication, which are often the main driving force in other applications areas, are less important in metrology because of the modest production volumes. Compatibility becomes an important issue when one tries to implement a reference element in a microsystem
Keywords :
calibration; electrostatic actuators; micromachining; micromechanical devices; transfer standards; voltage measurement; DC standard; MEMS structures; calibration; compatibility; high performance instruments; measurement applications; micromachining; microsystems; microtechnology; pull-in voltage; reproducibility; stability; thermal RMS-to-DC conversion; transfer standards; Biomembranes; Electrostatics; Integrated circuit measurements; Micromachining; Residual stresses; Resistors; Temperature measurement; Thermal force; Thermal resistance; Voltage;
fLanguage :
English
Journal_Title :
Instrumentation & Measurement Magazine, IEEE
Publisher :
ieee
ISSN :
1094-6969
Type :
jour
DOI :
10.1109/5289.953454
Filename :
953454
Link To Document :
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