Title :
Demonstration of a sidewall capacitor to evaluate dielectrics and metal barrier thin films
Author :
Lin, Kevin L. ; Carver, Colin T. ; Chebiam, Ramanan ; Clarke, Joseph ; Faber, Jean ; Harmes, Michael ; Indukuri, Tejaswi ; Jezewski, Christopher ; Kobrinsky, Mauro ; Krist, Brian ; Lakamraju, Narendra ; Lang, Helmut ; Myers, Alan M. ; Plombon, John J. ; S
Author_Institution :
Components Res., Intel Corp., Hillsboro, OR, USA
Abstract :
A sidewall planar capacitor (SW CAP) vehicle is developed to closely simulate processing conditions for metal barrier and dielectric in an integrated structure. For a known tantalum barrier for copper on a low-K dielectric, SW CAP TDDB is similar to those measured on an integrated vehicle. SW CAP results are useful for comparing electrical reliability of different dielectric systems, and effective in determining physical continuity of copper metal barriers.
Keywords :
capacitors; copper; dielectric materials; dielectric thin films; tantalum; Cu; TDDB; Ta; dielectric systems; dielectrics; electrical reliability; integrated structure; low-K dielectric; metal barrier thin films; sidewall planar capacitor vehicle; Capacitors; Dielectric measurement; Fabrication; Materials; Metals; Vehicles;
Conference_Titel :
Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4799-5016-4
DOI :
10.1109/IITC.2014.6831864
