DocumentCode :
1542405
Title :
Experimental study and modeling of the white noise sources in submicron Pand N-MOSFETs
Author :
Re, V. ; Bietti, I. ; Castello, R. ; Manghisoni, M. ; Speziali, V. ; Svelto, F.
Author_Institution :
Dipt. di Ingegneria, Univ. di Bergamo, Dalmine, Italy
Volume :
48
Issue :
4
fYear :
2001
fDate :
8/1/2001 12:00:00 AM
Firstpage :
1577
Lastpage :
1586
Abstract :
This paper presents the results of the experimental characterization of the channel thermal noise in MOSFETs belonging to a submicron gate process, with minimum gate length L=0.35 μm. The data are compared with a noise model taking into account short-channel effects such as velocity saturation and hot carriers. The contribution of gate and substrate parasitic resistors is also evaluated and included in the model. The analysis is carried out for devices with various gate geometries, investigating the behavior of the noise-related parameters in the range of small gate-to-source overdrive voltages, which is of major concern for low-power circuits
Keywords :
MOSFET; hot carriers; nuclear electronics; semiconductor device models; semiconductor device noise; thermal noise; channel thermal noise; gate geometries; gate-to-source overdrive voltages; hot carriers; low-power circuits; noise-related parameters; short-channel effects; submicron N-MOSFETs; submicron P-MOSFETs; submicron gate process; substrate parasitic resistors; velocity saturation; white noise sources; CMOS technology; Circuit noise; Detectors; Equations; Geometry; Hot carriers; MOSFET circuits; Semiconductor device modeling; Voltage; White noise;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.958399
Filename :
958399
Link To Document :
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