• DocumentCode
    154269
  • Title

    Selective carbon nanotube growth in via structure using novel arrangement of catalytic metal

  • Author

    Wada, Masaki ; Ito, Ban ; Saito, Takashi ; Nishide, Daisuke ; Ishikura, Taishi ; Isobayashi, Atsunobu ; Katagiri, Masayuki ; Yamazaki, Yasuyuki ; Matsumoto, Tad ; Kitamura, Masayuki ; Li Zhang ; Watanabe, Manabu ; Sakuma, Naoshi ; Kajita, Akihiro ; Sakai,

  • Author_Institution
    Low-power Electron. Assoc. & Project (LEAP), Tsukuba, Japan
  • fYear
    2014
  • fDate
    20-23 May 2014
  • Firstpage
    285
  • Lastpage
    288
  • Abstract
    We fabricated a carbon nanotube (CNT) via structure on a 300-mm wafer. We investigated the CNT chemical-mechanical polishing (CNT-CMP) behavior in an actual via pattern structure and clarified the technical issues of the CNT-CMP process. We developed a fabrication process of CNT via structures using selective CNT growth, which has a high potential for applying CNTs to high aspect ratio via structures.
  • Keywords
    carbon nanotubes; chemical mechanical polishing; vias; catalytic metal; chemical mechanical polishing; selective carbon nanotube growth; size 300 nm; via structure; Abstracts; Materials; Nickel; Silicon compounds; Tin; Tungsten;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC), 2014 IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4799-5016-4
  • Type

    conf

  • DOI
    10.1109/IITC.2014.6831881
  • Filename
    6831881
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=154269