DocumentCode :
1553783
Title :
Laser Wavelength Choices for Pico-Projector Applications
Author :
Buckley, Edward
Author_Institution :
Pixtronix, Inc., Andover, MA, USA
Volume :
7
Issue :
7
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
402
Lastpage :
406
Abstract :
The rapid progress in laser light source development, particularly in the gallium-nitride material system, means that a wide range of wavelengths are now available for pico-projection applications intended to deliver 20 lm or less. In principle, this affords designers of pico-projection systems great flexibility in choosing laser wavelengths to optimize specific performance metrics. With the proliferation of laser-based pico-projectors, however, it has become clear that current laser safety regulations and their wavelength-dependent classification criteria play a fundamental role in determining the brightness roadmaps of scanned-beam and liquid crystal on silicon (LCoS) pico-projection systems. In this paper, it is shown that it is possible to choose laser wavelengths to simultaneously maximize eye-safe luminous flux and color gamut, but that the resultant values are significantly different for Class 2 and Class 1 eye-safe projection systems.
Keywords :
laser beam applications; light sources; liquid crystal on silicon; color gamut; eye-safe luminous flux; gallium-nitride material system; laser safety regulations; laser wavelength; liquid crystal on silicon; performance metrics; pico-projector applications; scanned-beam; wavelength-dependent classification; wavelength-dependent classification criteria; Color; Diode lasers; Laser applications; Radiometry; Safety; Semiconductor lasers; Display human factors; displays; lasers;
fLanguage :
English
Journal_Title :
Display Technology, Journal of
Publisher :
ieee
ISSN :
1551-319X
Type :
jour
DOI :
10.1109/JDT.2011.2125944
Filename :
5876040
Link To Document :
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